Measuring and Analysis Techniques

Testing and evaluating materials, products and process media in the semiconductor industry and related technological industries necessitates the use of modern measuring and analysis methods.

We provide measuring and analysis techniques with high degree of detection sensitivity and high spatial resolution corresponding to the respective tasks.

SGS INSTITUT FRESENIUS has a wide range experience in the area of analytics and operates a modern laboratory service.
We will be happy to support you in product development, in process and manufacturing control and in failure and damage analysis.

Our laboratory equipment and analysis techniques:

• Materialography/light microscopy
• Scanning electron microscopy (SEM)
• Atomic force microscopy (AFM)
• Transmission electron microscopy (TEM)
• X-ray diffraction analysis (XRD)
• X-ray fluorescence analysis (XRF)
• X-ray topography (XRT)
• Electron probe microanalysis (EPMA)
• Auger electron spectrometry (AES)
• X-ray excited photoelectron spectrometry (XPS)
• Secondary ion mass spectrometry (SIMS)
• Time-of-flight spectrometry (TOF-SIMS)
• Spreading resistance profiling (SRP)
• Infrared spectroscopy (FTIR, ATR)
• Infrared microscopy
• Thermal analysis (TG, DSC, DTA)
• Mass spectrometry (GC-MS, ICP-MS)
• Optical emission spectroscopy (ICP-OES)
• Atom absorption spectroscopy (AAS)
• Ion chromatography (IC)
• Liquid chromatography (HPLC)

If required, we provide other methods in co-operation with our partners.

Contact:

SGS INSTITUT FRESENIUS GmbH
Königsbrücker Landstr. 161
D-01109 Dresden
t: +49 351 8841 - 0
f: +49 351 8841 – 190

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